The ability to build atomically precise structures on surfaces with complete control over both atomic placement and chemical bonding remains a central challenge in nanoscale fabrication. Here, we demonstrate simultaneous spatial and chemical control over the mechanosynthetic fabrication of carbon structures. Using inverted-mode STM, C$_2$ units are donated from surface-deposited molecules to pre-patterned reactive sites on a hydrogen-passivated Si(100) surface. We demonstrate single-site C$_2$ donation, spatially patterned multi-site C$_2$ donation, and the stepwise assembly of polyyne structures through successive C-C bond formation. Together, these results establish controlled mechanosynthetic donation as a foundational capability for programmable atomically precise fabrication.
I mean, I don’t want to detract from what they’ve done, but this sounds like pretty standard wafer fabrication research. I’m not in the field enough to comment on how significant of an advancement it is or isn’t, but it’s clearly lithography and deposition not some sci-fi nanotech that makes me look up who K. Eric Drexler is.
I mean, I don’t want to detract from what they’ve done, but this sounds like pretty standard wafer fabrication research. I’m not in the field enough to comment on how significant of an advancement it is or isn’t, but it’s clearly lithography and deposition not some sci-fi nanotech that makes me look up who K. Eric Drexler is.
I mean… I’m probably gonna look him up now